power magnetron

Influence of Target Power Density on Ga-Doped ZnO Thin Films Prepared by Middle-Frequency Alternative Magnetron Sputtering

功率密度对中频磁控溅射制备的氧化锌镓薄膜性能的影响

The microwave high temperature tube reactor consists of an anode power, a filament power, an electrical systems and a cooling system of the magnetron and the electrical components.

此外，该微波高温管式反应器还包含了阳极电源、灯丝电源、电气系统以及磁控管和电器元件的冷却系统。

The power supply will be convenient for controlling the magnetron sputtering coater automatically.

该电源为磁控溅射镀膜设备实现自动控制提供了方便。

Magnetron is often used as microwave power source in clinical linac magnetron.

在医用直线加速器中通常都采用磁控管作为微波功率源.

Aluminum-doped zinc oxide ( ZnO ∶ Al) films are deposited on Corning 1737 glass by RF magnetron sputtering under the substrate temperature of 250 ℃, RF power of 100W and pure argon gas.

在Corning1737玻璃衬底上射频磁控溅射沉积了铝掺杂ZnO薄膜（ZnO∶Al）.薄膜沉积在衬底温度250℃、溅射功率100W和纯氩气氛中进行。